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CATS News, Summer 2014

In June 2014 we released the latest version of CATS: J-2014.06. In this issue, we discuss the features and benefits of the new release.

Sentaurus Device - Technology Computer Aided Design (TCAD) | Synopsys

Advanced multi-dimensional (1D/2D/3D) device simulator

Synopsys DTCO Flow: Technology Development

Feb 1, 2019 - DTCO can be aptly described as a software-based methodology for developing new semiconductor process nodes with a holistic consideration of how technology elements impact circuit ...

DTCO: Screening and Selection of New Interconnect Metals with QuantumATK

Apr 5, 2019 - In the context of DTCO, new interconnect metals not only offer the promise of reduced parasitic loading in the MOL but also enable the integration of new scaling boosters such as ...


Next-generation CAD navigation standard for failure analysis, design debug and low-yield analysis


Most advanced and full featured mask data preparation (MDP) software available for semiconductor photomask manufacturing

IC Validator WorkBench

High Speed Layout Visualization


Odyssey is a production-centric yield management solution for wafer manufacturing


Proteus provides a comprehensive and powerful environment for performing full-chip proximity correction, building models for correction, and analyzing proximity effects on corrected and uncorrected...

Proteus Inverse Lithography Technology (ILT)

Advanced Correction of Optical Proximity Effects