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CATS News, Summer 2014

In June 2014 we released the latest version of CATS: J-2014.06. In this issue, we discuss the features and benefits of the new release.

Sentaurus Device

Advanced multi-dimensional (1D/2D/3D) device simulator

Synopsys Silicon Engineering Solutions

Silicon Manufacturing Down to 5nm & Below

What Happened To Inverse Lithography?

Oct 20, 2016 - Technology resurges as industry pushes to 7nm and 5nm.

Frenzy At 10/7nm

Sep 14, 2017 - Focus is on cutting costs across the board, and it turns out there is still quite a bit to cut.

Synopsys DTCO Flow: Technology Development

Feb 1, 2019 - DTCO can be aptly described as a software-based methodology for developing new semiconductor process nodes with a holistic consideration of how technology elements impact circuit ...

DTCO: Screening and Selection of New Interconnect Metals with QuantumATK

Apr 5, 2019 - In the context of DTCO, new interconnect metals not only offer the promise of reduced parasitic loading in the MOL but also enable the integration of new scaling boosters such as ...


Next-generation CAD navigation standard for failure analysis, design debug and low-yield analysis


Most advanced and full featured mask data preparation (MDP) software available for semiconductor photomask manufacturing

IC WorkBench Edit/View Plus

Powerful, hierarchical layout visualization and analysis tool, which allows viewing and editing GDSII and OASIS layouts from small IP blocks to full chip databases