In June 2014 we released the latest version of CATS: J-2014.06. In this issue, we discuss the features and benefits of the new release.
Advanced multi-dimensional (1D/2D/3D) device simulator
Feb 1, 2019 - DTCO can be aptly described as a software-based methodology for developing new semiconductor process nodes with a holistic consideration of how technology elements impact circuit ...
Apr 5, 2019 - In the context of DTCO, new interconnect metals not only offer the promise of reduced parasitic loading in the MOL but also enable the integration of new scaling boosters such as ...
Next-generation CAD navigation standard for failure analysis, design debug and low-yield analysis
Most advanced and full featured mask data preparation (MDP) software available for semiconductor photomask manufacturing
High Speed Layout Visualization
Odyssey is a production-centric yield management solution for wafer manufacturing
Proteus provides a comprehensive and powerful environment for performing full-chip proximity correction, building models for correction, and analyzing proximity effects on corrected and uncorrected...
Advanced Correction of Optical Proximity Effects