In June 2014 we released the latest version of CATS: J-2014.06. In this issue, we discuss the features and benefits of the new release.
Advanced multi-dimensional (1D/2D/3D) device simulator
Silicon Manufacturing Down to 5nm & Below
Sep 14, 2017 - Focus is on cutting costs across the board, and it turns out there is still quite a bit to cut.
Next-generation CAD navigation standard for failure analysis, design debug and low-yield analysis
Most advanced and full featured mask data preparation (MDP) software available for semiconductor photomask manufacturing
Powerful, hierarchical layout visualization and analysis tool, which allows viewing and editing GDSII and OASIS layouts from small IP blocks to full chip databases
Odyssey is a production-centric yield management solution for wafer manufacturing
Proteus provides a comprehensive and powerful environment for performing full-chip proximity correction, building models for correction, and analyzing proximity effects on corrected and uncorrected...
Advanced Correction of Optical Proximity Effects