In June 2014 we released the latest version of CATS: J-2014.06. In this issue, we discuss the features and benefits of the new release.
Advanced multi-dimensional (1D/2D/3D) device simulator
Synopsys Silicon Engineering Solutions
Silicon Manufacturing Down to 5nm & Below
What Happened To Inverse Lithography?
Oct 20, 2016 - Technology resurges as industry pushes to 7nm and 5nm.
Sep 14, 2017 - Focus is on cutting costs across the board, and it turns out there is still quite a bit to cut.
Synopsys DTCO Flow: Technology Development
Feb 1, 2019 - DTCO can be aptly described as a software-based methodology for developing new semiconductor process nodes with a holistic consideration of how technology elements impact circuit ...
DTCO: Screening and Selection of New Interconnect Metals with QuantumATK
Apr 5, 2019 - In the context of DTCO, new interconnect metals not only offer the promise of reduced parasitic loading in the MOL but also enable the integration of new scaling boosters such as ...
Next-generation CAD navigation standard for failure analysis, design debug and low-yield analysis
Most advanced and full featured mask data preparation (MDP) software available for semiconductor photomask manufacturing
Powerful, hierarchical layout visualization and analysis tool, which allows viewing and editing GDSII and OASIS layouts from small IP blocks to full chip databases