Comprehensive data prep solutions for mask and direct write
Modules to support mask metrology marking
Support of all major laser exposure and inspection tools
Delivers highly scalable and cost-effective MDP
Fast and comprehensive mask rule check
Mask manufacturing at technology nodes below 20nm presents new challenges for mask lithography and verification. Release K-2015.09 of CATS breaks new ground in addressing these challenges.
In June 2014 we released the latest version of CATS: J-2014.06. In this issue, we discuss the features and benefits of the new release.
In this issue we focus on future device technologies with a contributed article on thin channel transistors and two articles covering recent trends in power electronics.
This newsletter highlights new capabilities in CATS which help increase efficiency of your MDP flows. These new capabilities include dynamic queue management (DQM) for DP jobs, in-die registration ...
In this edition of Wafer Focus, read about photomask manufacturing while learning from industry experts some of the challenges engineers face as they utilize new technologies, as well as ...