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Computer Aided Transcription System (CATS) Lithography Output Options | Synopsys

Comprehensive data prep solutions for mask and direct write

Computer Aided Transcription System (CATS) Inspection Data Prep | Synopsys

Support of all major laser exposure and inspection tools

SmartMRC Mask Rule Check | Synopsys

Fast and comprehensive mask rule check

CATS News, Fall 2015

Mask manufacturing at technology nodes below 20nm presents new challenges for mask lithography and verification. Release K-2015.09 of CATS breaks new ground in addressing these challenges.

CATS News, Summer 2014

In June 2014 we released the latest version of CATS: J-2014.06. In this issue, we discuss the features and benefits of the new release.

Wafer Focus, Summer 2012

In this issue we focus on future device technologies with a contributed article on thin channel transistors and two articles covering recent trends in power electronics.

CATS News, Spring 2012

This newsletter highlights new capabilities in CATS which help increase efficiency of your MDP flows. These new capabilities include dynamic queue management (DQM) for DP jobs, in-die registration ...

Wafer Focus, Fall 2011

In this edition of Wafer Focus, read about photomask manufacturing while learning from industry experts some of the challenges engineers face as they utilize new technologies, as well as ...