Customizable yield-management software that helps achieve and maintain high yields by allowing engineers to quickly collect, correlate, analyze and share critical data.
Design-centric yield management for product engineering
Jun 30, 2014 - Collaboration enables stochastic modeling of device degradation and reliability through industry leading Sentaurus Device TCAD simulator
Dec 16, 2014 - Enables Delivery of Accurate Sentaurus TCAD Models for Nanowire, FinFET and Tunnel-FET Transistors
May 23, 2016 - Acquisition supports the Synopsys TCAD strategy to offer a comprehensive solution to reduce development time and cost for advanced node development by enabling the evaluation and ...
May 23, 2016 - Enables Earlier Co-Optimization of Devices, Processes, Materials and Design
Jul 11, 2016 - Synopsys' Process Explorer and Raphael accurately simulate parasitic resistance of alternative metals and liner-barrier materials at the 7nm node and beyond
Dec 5, 2016 - Model Developed Through Collaboration Between Synopsys and IIT Bombay to Simulate Negative-Bias Temperature Instability in FinFET and Nanowire FET at 7nm, 5nm and Below
Sep 18, 2017 - Materials Modeling Enables Semiconductor Manufacturers to Save Time and Cost for Advanced Process Node Development
Mask manufacturing at technology nodes below 20nm presents new challenges for mask lithography and verification. Release K-2015.09 of CATS breaks new ground in addressing these challenges.