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IBM and Synopsys Accelerate 3nm Process Development with DTCO Innovations

Aug 15, 2018 - Synopsys Manufacturing, IP, and Design Implementation Technologies Enable Industry's Only Complete DTCO Flow

Synopsys Helps Advance IBM’s Vision of 1,000 Times Improvement in AI Compute ...

Oct. 21, 2020 - Synopsys announced the latest stages in its ongoing collaboration with IBM Research's AI Hardware Center to advance the development of chip architectures and design methodologies ...

CATS News, Fall 2015

Mask manufacturing at technology nodes below 20nm presents new challenges for mask lithography and verification. Release K-2015.09 of CATS breaks new ground in addressing these challenges.

CATS News, Spring 2012

This newsletter highlights new capabilities in CATS which help increase efficiency of your MDP flows. These new capabilities include dynamic queue management (DQM) for DP jobs, in-die registration ...

CATS News, Summer 2017

This edition of CATS News addresses the mask manufacturing community's stress to deliver high-quality masks for sub-10nm technology nodes while, at the same time, maintaining very high mask ...

TCAD News, Winter 2019

In this edition, learn about a Sentaurus TCAD methodology for simulating the electrical characteristics of the polysilicon channel in 3D NAND, and also the exploration of 2D-material FETs, emerging...

TCAD News, Fall 2011

This edition of TCAD News is dedicated to the F-2011.09 release of TCAD Sentaurus which supports the latest processes (plasma implantation, silicon stress and orientation-dependent mobility), ...

TCAD News, Fall 2014

Welcome to the September 2014 edition of TCAD News. While 14nm FinFET is close to mass production, the development of 10 and 7nm nodes is well underway. The J-2014.09 release of TCAD Sentaurus ...

TCAD News, Spring 2011

device reliability. The second article reviews the effect of hot carriers in semiconductor device operation and reliability, and illustrates the combination of hot-carrier energy and degradation ...

TCAD News, Spring 2013

In this edition we present the new features and enhancements in the H-2013.03 release of TCAD Sentaurus, which includes a number of important new and updated features addressing the modeling ...