In this special 2011 IEDM edition of TCAD News, we present two articles which are highly relevant to advanced logic and memory technologies. The first article discusses a recently developed ...
This is the IEDM 2013 edition of the TCAD News. In this issue, we provide an overview of Sentaurus I-2013.12 with new features and models to support the development of the latest technologies for ...
In this edition, learn about Synopsys solutions for the development of advanced logic process nodes and NBTI modeling in Sentaurus Device.
This edition of TCAD News has a special significance because it highlights the products from our recent acquisition of QuantumWise.
In this edition of Wafer Focus, read about photomask manufacturing while learning from industry experts some of the challenges engineers face as they utilize new technologies, as well as ...
In this issue we focus on future device technologies with a contributed article on thin channel transistors and two articles covering recent trends in power electronics.
Mask manufacturing excellence, Mask Data Preparation, MDP, CATS
Fast and comprehensive mask rule check
Technology leading mask data preparation
Basic and advanced fracture