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Sentaurus Lithography

Sentaurus Lithography represents advanced modeling for semiconductor device manufacturing process development and optimization, covering a wide-range of applications in optical, immersion, EUV, and...

Proteus WorkBench

Proteus WorkBench provides a single tool environment that facilitates building models, tuning correction recipes for full-chip OPC, and analyzing proximity effects on corrected and uncorrected IC ...

Proteus

Proteus provides a comprehensive and powerful environment for performing full-chip proximity correction, building models for correction, and analyzing proximity effects on corrected and uncorrected...

Proteus Inverse Lithography Technology (ILT)

Advanced Correction of Optical Proximity Effects

Sentaurus Lithography PWA

Sentaurus Lithography process window analyzer (PWA) is a comprehensive and powerful tool for visualizing and analyzing simulation results or experimental data, for example, obtained by critical ...

Odyssey

Odyssey is a production-centric yield management solution for wafer manufacturing

CATS SmartMRC

Industry’s highest performance solution for mask rule check and pattern matching

CATS

Most advanced and full featured mask data preparation (MDP) software available for semiconductor photomask manufacturing

Avalon

Next-generation CAD navigation standard for failure analysis, design debug and low-yield analysis

Yield Manager

Customizable yield-management software that helps achieve and maintain high yields by allowing engineers to quickly collect, correlate, analyze and share critical data.