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Avalon

Next-generation CAD navigation standard for failure analysis, design debug and low-yield analysis

CATS

Most advanced and full featured mask data preparation (MDP) software available for semiconductor photomask manufacturing

IC Validator WorkBench

High Speed Layout Visualization

Odyssey

Odyssey is a production-centric yield management solution for wafer manufacturing

Proteus

Proteus provides a comprehensive and powerful environment for performing full-chip proximity correction, building models for correction, and analyzing proximity effects on corrected and uncorrected...

Proteus Inverse Lithography Technology (ILT)

Advanced Correction of Optical Proximity Effects

Proteus WorkBench

Proteus WorkBench provides a single tool environment that facilitates building models, tuning correction recipes for full-chip OPC, and analyzing proximity effects on corrected and uncorrected IC ...

Proteus LRC

Proteus LRC is Synopsys' next generation OPC verification tool enabling fast and accurate hotspot detection across the process window for full-chip mask validation within the Proteus Pipeline ...

Sentaurus Lithography

Sentaurus Lithography represents advanced modeling for semiconductor device manufacturing process development and optimization, covering a wide-range of applications in optical, immersion, EUV, and...

Sentaurus Lithography PWA

Sentaurus Lithography process window analyzer (PWA) is a comprehensive and powerful tool for visualizing and analyzing simulation results or experimental data, for example, obtained by critical ...