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Avalon

Next-generation CAD navigation standard for failure analysis, design debug and low-yield analysis

CATS

Most advanced and full featured mask data preparation (MDP) software available for semiconductor photomask manufacturing

CATS SmartMRC

Industry’s highest performance solution for mask rule check and pattern matching

ESD Services

TCAD ESD workbench and circuit compact model development services

IC WorkBench Edit/View Plus

Powerful, hierarchical layout visualization and analysis tool, which allows viewing and editing GDSII and OASIS layouts from small IP blocks to full chip databases

Odyssey

Odyssey is a production-centric yield management solution for wafer manufacturing

Proteus

Proteus provides a comprehensive and powerful environment for performing full-chip proximity correction, building models for correction, and analyzing proximity effects on corrected and uncorrected...

Proteus Inverse Lithography Technology (ILT)

Advanced Correction of Optical Proximity Effects

Proteus LRC

Proteus LRC is Synopsys' next generation OPC verification tool enabling fast and accurate hotspot detection across the process window for full-chip mask validation within the Proteus Pipeline ...

Proteus WorkBench

Proteus WorkBench provides a single tool environment that facilitates building models, tuning correction recipes for full-chip OPC, and analyzing proximity effects on corrected and uncorrected IC ...