Next-generation CAD navigation standard for failure analysis, design debug and low-yield analysis
Most advanced and full featured mask data preparation (MDP) software available for semiconductor photomask manufacturing
Industry’s highest performance solution for mask rule check and pattern matching
TCAD ESD workbench and circuit compact model development services
High Speed Layout Visualization
Odyssey is a production-centric yield management solution for wafer manufacturing
Proteus provides a comprehensive and powerful environment for performing full-chip proximity correction, building models for correction, and analyzing proximity effects on corrected and uncorrected...
Advanced Correction of Optical Proximity Effects
Proteus LRC is Synopsys' next generation OPC verification tool enabling fast and accurate hotspot detection across the process window for full-chip mask validation within the Proteus Pipeline ...
Proteus WorkBench provides a single tool environment that facilitates building models, tuning correction recipes for full-chip OPC, and analyzing proximity effects on corrected and uncorrected IC ...