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Synopsys Suggests


Next-generation CAD navigation standard for failure analysis, design debug and low-yield analysis


Most advanced and full featured mask data preparation (MDP) software available for semiconductor photomask manufacturing


Industry’s highest performance solution for mask rule check and pattern matching

ESD Services

TCAD ESD workbench and circuit compact model development services

IC Validator WorkBench

High Speed Layout Visualization


Odyssey is a production-centric yield management solution for wafer manufacturing


Proteus provides a comprehensive and powerful environment for performing full-chip proximity correction, building models for correction, and analyzing proximity effects on corrected and uncorrected...

Proteus Inverse Lithography Technology (ILT)

Advanced Correction of Optical Proximity Effects

Proteus LRC

Proteus LRC is Synopsys' next generation OPC verification tool enabling fast and accurate hotspot detection across the process window for full-chip mask validation within the Proteus Pipeline ...

Proteus WorkBench

Proteus WorkBench provides a single tool environment that facilitates building models, tuning correction recipes for full-chip OPC, and analyzing proximity effects on corrected and uncorrected IC ...