Feb 1, 2019 - DTCO can be aptly described as a software-based methodology for developing new semiconductor process nodes with a holistic consideration of how technology elements impact circuit ...
Industry’s highest performance solution for mask rule check and pattern matching
Most advanced and full featured mask data preparation (MDP) software available for semiconductor photomask manufacturing
This edition of CATS News addresses the mask manufacturing community's stress to deliver high-quality masks for sub-10nm technology nodes while, at the same time, maintaining very high mask ...
Mask Synthesis, Mask Data Preparation, TCAD, Yield Management, Atomistic Scale Modeling
Mask manufacturing excellence, Mask Data Preparation, MDP, CATS
Technology leading mask data preparation
Basic and advanced fracture
Correction of E-beam and optical proximity effects
Powerful and highly interactive mask and pattern support