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Synopsys DTCO Flow: Technology Development

Feb 1, 2019 - DTCO can be aptly described as a software-based methodology for developing new semiconductor process nodes with a holistic consideration of how technology elements impact circuit ...


Most advanced and full featured mask data preparation (MDP) software available for semiconductor photomask manufacturing


Industry’s highest performance solution for mask rule check and pattern matching

CATS News, Fall 2015

Mask manufacturing at technology nodes below 20nm presents new challenges for mask lithography and verification. Release K-2015.09 of CATS breaks new ground in addressing these challenges.

CATS News, Spring 2012

This newsletter highlights new capabilities in CATS which help increase efficiency of your MDP flows. These new capabilities include dynamic queue management (DQM) for DP jobs, in-die registration ...

CATS News, Summer 2014

In June 2014 we released the latest version of CATS: J-2014.06. In this issue, we discuss the features and benefits of the new release.

CATS News, Summer 2017

This edition of CATS News addresses the mask manufacturing community's stress to deliver high-quality masks for sub-10nm technology nodes while, at the same time, maintaining very high mask ...

Wafer Focus, Fall 2011

In this edition of Wafer Focus, read about photomask manufacturing while learning from industry experts some of the challenges engineers face as they utilize new technologies, as well as ...

Wafer Focus, Summer 2012

In this issue we focus on future device technologies with a contributed article on thin channel transistors and two articles covering recent trends in power electronics.

Mask Data Preparation | Synopsys

Mask manufacturing excellence, Mask Data Preparation, MDP, CATS