Most advanced and full featured mask data preparation (MDP) software available for semiconductor photomask manufacturing
Mask manufacturing at technology nodes below 20nm presents new challenges for mask lithography and verification. Release K-2015.09 of CATS breaks new ground in addressing these challenges.
This newsletter highlights new capabilities in CATS which help increase efficiency of your MDP flows. These new capabilities include dynamic queue management (DQM) for DP jobs, in-die registration ...
In June 2014 we released the latest version of CATS: J-2014.06. In this issue, we discuss the features and benefits of the new release.
This edition of CATS News addresses the mask manufacturing community's stress to deliver high-quality masks for sub-10nm technology nodes while, at the same time, maintaining very high mask ...
Industry’s highest performance solution for mask rule check and pattern matching
Delivers highly scalable and cost-effective MDP
Basic and advanced fracture
Support of all major laser exposure and inspection tools
Powerful and highly interactive mask and pattern support