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Synopsys DTCO Flow: Technology Development

Feb 1, 2019 - DTCO can be aptly described as a software-based methodology for developing new semiconductor process nodes with a holistic consideration of how technology elements impact circuit ...

Sentaurus Lithography

Sentaurus Lithography represents advanced modeling for semiconductor device manufacturing process development and optimization, covering a wide-range of applications in optical, immersion, EUV, and...

Proteus WorkBench

Proteus WorkBench provides a single tool environment that facilitates building models, tuning correction recipes for full-chip OPC, and analyzing proximity effects on corrected and uncorrected IC ...

Proteus

Proteus provides a comprehensive and powerful environment for performing full-chip proximity correction, building models for correction, and analyzing proximity effects on corrected and uncorrected...

Proteus Inverse Lithography Technology (ILT)

Advanced Correction of Optical Proximity Effects

Sentaurus Lithography PWA

Sentaurus Lithography process window analyzer (PWA) is a comprehensive and powerful tool for visualizing and analyzing simulation results or experimental data, for example, obtained by critical ...

Synopsys Silicon Engineering Solutions

Mask Synthesis, Mask Data Preparation, TCAD, Yield Management, Atomistic Scale Modeling

Mask Synthesis | Synopsys

Leading-edge lithography solutions

Synopsys Proteus

Full-chip mask synthesis

Lithography Rule Check - Proteus | Synopsys

Full-chip verification through process window