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Synopsys DTCO Flow: Technology Development

Feb 1, 2019 - DTCO can be aptly described as a software-based methodology for developing new semiconductor process nodes with a holistic consideration of how technology elements impact circuit ...

Sentaurus Lithography

Sentaurus Lithography represents advanced modeling for semiconductor device manufacturing process development and optimization, covering a wide-range of applications in optical, immersion, EUV, and...

Proteus WorkBench

Proteus WorkBench provides a single tool environment that facilitates building models, tuning correction recipes for full-chip OPC, and analyzing proximity effects on corrected and uncorrected IC ...


Proteus provides a comprehensive and powerful environment for performing full-chip proximity correction, building models for correction, and analyzing proximity effects on corrected and uncorrected...

Proteus Inverse Lithography Technology (ILT)

Advanced Correction of Optical Proximity Effects

Sentaurus Lithography PWA

Sentaurus Lithography process window analyzer (PWA) is a comprehensive and powerful tool for visualizing and analyzing simulation results or experimental data, for example, obtained by critical ...

IC WorkBench Edit/View Plus

Powerful, hierarchical layout visualization and analysis tool, which allows viewing and editing GDSII and OASIS layouts from small IP blocks to full chip databases

Frenzy At 10/7nm

Sep 14, 2017 - Focus is on cutting costs across the board, and it turns out there is still quite a bit to cut.

Synopsys Silicon Engineering Solutions

Silicon Manufacturing Down to 5nm & Below

Mask Synthesis

Leading-edge lithography solutions