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TCAD News, Winter 2019

In this edition, learn about a Sentaurus TCAD methodology for simulating the electrical characteristics of the polysilicon channel in 3D NAND, and also the exploration of 2D-material FETs, emerging...

Synopsys DTCO Flow: Technology Development

Feb 1, 2019 - DTCO can be aptly described as a software-based methodology for developing new semiconductor process nodes with a holistic consideration of how technology elements impact circuit ...

IBM and Synopsys Accelerate 3nm Process Development with DTCO Innovations

Aug 15, 2018 - Synopsys Manufacturing, IP, and Design Implementation Technologies Enable Industry's Only Complete DTCO Flow

TCAD News, Winter 2017

This edition of TCAD News has a special significance because it highlights the products from our recent acquisition of QuantumWise.

Synopsys Strengthens Design-Technology Co-Optimization Solution with ...

Sep 18, 2017 - Materials Modeling Enables Semiconductor Manufacturers to Save Time and Cost for Advanced Process Node Development

Synopsys Silicon Engineering Solutions

Mask Synthesis, Mask Data Preparation, TCAD, Yield Management, Atomistic Scale Modeling

Process Simulation - Technology Computer Aided Design (TCAD) | Synopsys

Virtually model the fabrication process of semiconductor devices

Sentaurus Topography - Technology Computer Aided Design (TCAD) | Synopsys

Accurate modeling of topographical process steps