In this edition, learn about a Sentaurus TCAD methodology for simulating the electrical characteristics of the polysilicon channel in 3D NAND, and also the exploration of 2D-material FETs, emerging...
Feb 1, 2019 - DTCO can be aptly described as a software-based methodology for developing new semiconductor process nodes with a holistic consideration of how technology elements impact circuit ...
Aug 15, 2018 - Synopsys Manufacturing, IP, and Design Implementation Technologies Enable Industry's Only Complete DTCO Flow
This edition of TCAD News has a special significance because it highlights the products from our recent acquisition of QuantumWise.
Sep 18, 2017 - Materials Modeling Enables Semiconductor Manufacturers to Save Time and Cost for Advanced Process Node Development
Mask Synthesis, Mask Data Preparation, TCAD, Yield Management, Atomistic Scale Modeling
Virtually model the fabrication process of semiconductor devices
Advanced 1D, 2D and 3D process simulator
Advanced 1D and 2D process simulator
Accurate modeling of topographical process steps